| 摘要 |
<p>In one aspect, a semiconductor fabrication system includes an air-tight housing in which an inert gas is admittable and exhaustible; and a plurality of deposition chambers positioned within the system. The apparatus includes a substrate (222), pedestal electrode (224), substrate power supply (236), gas inlet (232), mass flow controller (233), gas supply (28), vacuum pump system (234), pumping port (236), magnets (102, 104, 106, 108), targets (110, 120), electron confinement region (130), and power supply (140).</p> |
