发明名称 Imprint lithography template having opaque alignment marks
摘要 The present invention is directed to providing a template with alignment marks that are opaque to selective wavelength of light. In one embodiment, a template is provided having patterning areas and a template, with the template mark being formed from metal and disposed outside of the patterning areas. The alignment marks may be surrounded by a moat to prevent curable liquid from being in superimposition therewith during imprinting. In this manner, opaque alignment marks may be employed without degrading the quality of the pattern formed during imprinting.
申请公布号 US2005067379(A1) 申请公布日期 2005.03.31
申请号 US20030670980 申请日期 2003.09.25
申请人 MOLECULAR IMPRINTS, INC. 发明人 SREENIVASAN SIDLGATA V.;SCHUMAKER PHILIP D.
分类号 C23F1/00;G03F7/00;G03F9/00;(IPC1-7):C23F1/00 主分类号 C23F1/00
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