发明名称 PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive element using a protective film which has properties equivalent to those of a conventional polyolefin-base protective film and does not put too much load on the environment, and to provide a resist pattern forming method and a method for manufacturing a printed wiring board. <P>SOLUTION: The photosensitive element comprises a support film, a photosensitive resin composition layer located on the support film, and a protective film located on the photosensitive resin composition layer, wherein the protective film has a thickness of 5-30 &mu;m and is based on a polylactic acid which is a biodegradable polymer. The resist pattern forming method and the method for manufacturing a printed wiring board use the photosensitive element. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005084495(A) 申请公布日期 2005.03.31
申请号 JP20030318248 申请日期 2003.09.10
申请人 HITACHI CHEM CO LTD 发明人 KUBOTA MASAO
分类号 G03F7/11;G03F7/004;H05K3/06;H05K3/18 主分类号 G03F7/11
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