发明名称 |
OPTICAL COMPENSATION IN HIGH NUMERICAL APERTURE PHOTOMASK INSPECTION SYSTEMS FOR INSPECTING PHOTOMASKS THROUGH THICK PELLICLES |
摘要 |
An objective lens system (201) having reconfigurable optical components that enable the inspection of inspection surfaces in the absence of a pellicle or through a thin membrane pellicle, and using the same system, also enabling the inspection of inspection surfaces through a thick pellicle. An objective lens system includes a first group (202) and a second group (203) of optical elements. The first group (201) of optical elements enables high numerical aperture and beam contraction. The second group (203) of optical elements is capable of two mode operation enabling, in one mode, inspection through a thin membrane pellicle or in the absence of a pellicle and in another mode, enabling inspection through a thick pellicle. The system can also be enhanced through the use of an interposable aberration corrector plate that is used to correct optical aberrations caused by the presence, absence, or thickness of pellicles. |
申请公布号 |
WO2004021049(A3) |
申请公布日期 |
2005.03.31 |
申请号 |
WO2003US27011 |
申请日期 |
2003.08.27 |
申请人 |
KLA-TENCOR TECHNOLOGIES, CORPORATION |
发明人 |
RONCONE, RONALD, L.;KVAMME, DAMON, F. |
分类号 |
G02B13/00;G01N21/956;G03F1/08 |
主分类号 |
G02B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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