发明名称 |
CVD of PtRh with good adhesion and morphology |
摘要 |
A method and system for performing metal-organic chemical vapor deposition (MOCVD). The method introduces a metal-organic compound into the CVD chamber in the presence of a first reactant selected to have a reducing chemistry and then, subsequently, a second reactant selected to have an oxidizing chemistry. The reducing chemistry results in deposition of metal species having a reduced surface mobility creating more uniform coverage and better adhesion. The oxidizing species results in deposition of metal species having a greater surface mobility leading to greater surface agglomeration and faster growth. By alternating the two reacts, faster growth is achieved and uniformity of the metal structure is enhanced.
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申请公布号 |
US2005066895(A1) |
申请公布日期 |
2005.03.31 |
申请号 |
US20040991693 |
申请日期 |
2004.11.18 |
申请人 |
LI WEIMIN;VISOKAY MARK R. |
发明人 |
LI WEIMIN;VISOKAY MARK R. |
分类号 |
C23C16/02;C23C16/18;C23C16/44;C23C16/455;H01L21/285;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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