| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus, in which bubbles are not mixed in liquid which fills the space between a substrate to be transferred and the optical element of a projection optical system closest to the substrate to be transferred, pressure variation in the liquid is suppressed or the variation of refractive index of the liquid is suppressed, and high resolution can be realized. SOLUTION: The exposure apparatus having a projection optical system for projecting a reticle pattern to a substrate, in which the space between the substrate and an optical element of the projection optical system closest to the substrate is filled with liquid at least partially comprises a liquid supply system, a liquid-collecting system, a bubble-removing body which passes gas but does not pass liquid, and an exhaust system for removing bubble in the liquid via the bubble-removing body. COPYRIGHT: (C)2005,JPO&NCIPI
|
