| 摘要 |
The vacuum deposition device includes a vacuum deposition chamber, a vacuum evacuator for evacuating an inside of the chamber, at least one first evaporator which evaporates a first film forming, at least one second evaporator which evaporates a second film forming material. One of the first and second evaporators which is closer to the substrate is spaced apart from the substrate in a vertical direction by 100 to 300 mm. The substrate, the first evaporator and the second evaporator are installed at positions, which satisfy a condition of an expression (1): 0.3<=L1/L2<=50. L1 is a distance in a vertical direction from a horizontal plane of a first or second evaporation port of the first or second evaporator to a surface of the substrate, and L2 is the shortest distance between the first evaporation port and the second evaporation port.
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