发明名称 Tun dish and method for production of a metal strip of high purity
摘要 To achieve the highest possible separation rate for foreign particles in a tundish combined, at the same time, with a minimized level of inclusions, the refractory-lined interior space of the tundish, as a function of an operating bath level (h), satisfies the condition that a dimensionless ratio (kappa) of the refractory-lined surface area (Aref) to the filling volume (V) which is delimited by this refractory-lined surface area and the bath-level-dependent exposed surface area (ATop) and results from the relationship <math-cwu id="MATH-US-00001"> <NUMBER>1</NUMBER> <MATH> <MROW> <MI>kappa</MI> <MO>=</MO> <MFRAC> <MSUB> <MI>A</MI> <MI>ref</MI> </MSUB> <MSUP> <MROW> <MO>(</MO> <MI>V</MI> <MO>)</MO> </MROW> <MFRAC> <MN>2</MN> <MN>3</MN> </MFRAC> </MSUP> </MFRAC> </MROW> </MATH> <mathematica-file id="MATHEMATICA-00001" file="US20050067134A1-20050331-M00001.NB"/> <image id="EMI-M00001" wi="216.027" he="23.04855" file="US20050067134A1-20050331-M00001.TIF" imf="TIFF" ti="MF"/> </MATH-CWU> be between 3.83 and 4.39.
申请公布号 US2005067134(A1) 申请公布日期 2005.03.31
申请号 US20040498797 申请日期 2004.07.14
申请人 BRUMMAYER MARKUS;ECKERSTORFER GERALD;HOHENBICHLER GERALD;MOERWALD KARL 发明人 BRUMMAYER MARKUS;ECKERSTORFER GERALD;HOHENBICHLER GERALD;MOERWALD KARL
分类号 B22D11/10;B22D11/14;B22D11/18;B22D41/08;(IPC1-7):B22D11/10 主分类号 B22D11/10
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