发明名称 |
Semiconductor memory device allowing accurate burn-in test |
摘要 |
An insulated gate type field effect transistor in a memory cell array is a transistor having a gate insulating film which is thicker than a gate insulating film of an insulated gate type field effect transistor in an array peripheral circuit. DRAM (Dynamic Random Access Memory) cell-based semiconductor memory device can be implemented which allows a burn-in test to be accurately performed without degrading sensing operation characteristics even under a low power supply voltage.
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申请公布号 |
US2005068838(A1) |
申请公布日期 |
2005.03.31 |
申请号 |
US20040947213 |
申请日期 |
2004.09.23 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
KONO TAKASHI;HAMAMOTO TAKESHI |
分类号 |
H01L27/108;G11C8/08;G11C11/34;G11C11/401;G11C11/409;G11C29/12;H01L21/8242;H01L27/10;(IPC1-7):G11C8/00 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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