发明名称 Semiconductor memory device allowing accurate burn-in test
摘要 An insulated gate type field effect transistor in a memory cell array is a transistor having a gate insulating film which is thicker than a gate insulating film of an insulated gate type field effect transistor in an array peripheral circuit. DRAM (Dynamic Random Access Memory) cell-based semiconductor memory device can be implemented which allows a burn-in test to be accurately performed without degrading sensing operation characteristics even under a low power supply voltage.
申请公布号 US2005068838(A1) 申请公布日期 2005.03.31
申请号 US20040947213 申请日期 2004.09.23
申请人 RENESAS TECHNOLOGY CORP. 发明人 KONO TAKASHI;HAMAMOTO TAKESHI
分类号 H01L27/108;G11C8/08;G11C11/34;G11C11/401;G11C11/409;G11C29/12;H01L21/8242;H01L27/10;(IPC1-7):G11C8/00 主分类号 H01L27/108
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