发明名称 Method for micro-roughening treatment of copper and mixed-metal circuitry
摘要 Process to improve adhesion of dielectric materials to a metal layer, including providing an unpatterned metal layer having a first major surface; micro-roughening the first major surface to form a micro-roughened surface; and etching the metal layer to form a circuit pattern in the metal layer, in which the micro-roughening is carried out prior to the etching.
申请公布号 US2005067378(A1) 申请公布日期 2005.03.31
申请号 US20030675019 申请日期 2003.09.30
申请人 FUERHAUPTER HARRY;BARON DAVID THOMAS;JOHAL KULDIP SINGH;BROOKS PATRICK PAUL 发明人 FUERHAUPTER HARRY;BARON DAVID THOMAS;JOHAL KULDIP SINGH;BROOKS PATRICK PAUL
分类号 C23F1/18;H05K3/02;H05K3/06;H05K3/38;H05K3/46;(IPC1-7):B44C1/22 主分类号 C23F1/18
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