发明名称 |
Photoemission electron microscopy and measuring method using the microscopy |
摘要 |
A photoemission electron microscopy having a light source system for carrying out a high-resolution measurement such as work function distribution measurement or magnetic domain distribution with reliability, and a high-sensitivity measurement method using the photoemission electron microscopy. A photoemission electron microscopy having an excitation light source system in which a specimen is irradiated with irradiation light from a light source uses a vacuum chamber in which the specimen is placed and an objective lens which collects the irradiation light on a specimen surface. The objective lens is accommodated in the vacuum chamber. The light source may be placed outside the vacuum chamber. A condenser lens which makes the irradiation light from the light source generally parallel may be placed between the light source and the vacuum chamber. A transmission window which transmits the irradiation light while the vacuum chamber is sealed may be placed between the condenser lens and the objective lens. If a diffraction grating for selecting the wavelength of the irradiation light or a polarizing filter for selecting the direction of circularly polarized light in the irradiation light is used between the condenser lens and the transmission window, a high-resolution measurement of a work function distribution or a magnetic domain distribution on the specimen surface can be carried out.
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申请公布号 |
US2005067566(A1) |
申请公布日期 |
2005.03.31 |
申请号 |
US20040937337 |
申请日期 |
2004.09.10 |
申请人 |
ULVAC-PHI, INC.;TAKANORI KOSHIKAWA |
发明人 |
KOSHIKAWA TAKANORI;IKUTA TAKASHI;YASUE TSUNEO;TAGUCHI MASAMI;TANAKA IBUKI |
分类号 |
G01N23/227;G01N21/17;G01N21/19;G01N21/21;G21K7/00;H01J37/252;H01J37/26;H01J37/285;(IPC1-7):H01J37/285 |
主分类号 |
G01N23/227 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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