A POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING

摘要

The present invention provides in one embodiment, a polishing pad (100) for chemical mechanical polishing. The polishing pad comprises a polishing body (110). The polishing body comprises a thermoplastic foam substrate (115) having a surface (120) comprising concave cells (125). A polishing agent (130) coats an interior surface (135) of the concave cells. The polishing agent comprises an inorganic metal oxide that includes carbides or nitrides. Yet another embodiment of the present invention is a method for preparing a polishing pad (200).