发明名称 Semiconductor device and production method thereof
摘要 A semiconductor device and the production method thereof capable of reducing warps of a semiconductor wafer when packaging at a wafer level in a SiP type semiconductor device, is configured that an insulating layer is formed by stacking a plurality of resin layers on a semiconductor chip formed with an electronic circuit, wiring layers are buried in the insulating layer and electrically connected to electrodes, and formation areas of the plurality of resin layers become gradually smaller from an area of an upper surface of the semiconductor chip as they get farther from the semiconductor chip, so that a side surface and an upper surface of each of the resin layers and the upper surface of the semiconductor chip form a stepwise shape.
申请公布号 US2005067706(A1) 申请公布日期 2005.03.31
申请号 US20040930797 申请日期 2004.09.01
申请人 SONY CORPORATION 发明人 YAMAGATA OSAMU
分类号 H01L21/768;H01L21/78;H01L23/12;H01L23/522;H01L23/532;H01L25/00;(IPC1-7):H01L27/10 主分类号 H01L21/768
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