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发明名称
INTERMETAL DIELECTRIC LAYER FOR INTEGRATED CIRCUITS
摘要
申请公布号
SG109507(A1)
申请公布日期
2005.03.30
申请号
SG20020006755
申请日期
2000.12.13
申请人
CHARTERED SEMICONDUCTOR MANUFACTURING LTD;LUCENT TECHNOLOGIES INC.
发明人
HUANG LIU;JOHN SUDIJONO;TAN JUAN BOON;EDWIN GOH;ALAN CUTHBERTSON;ARTHUR ANG;CHEN FENG
分类号
H01L21/316;H01L21/768;(IPC1-7):H01L23/48;H01L23/52;H01L29/40
主分类号
H01L21/316
代理机构
代理人
主权项
地址
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