| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector. |
| 申请公布号 |
SG109608(A1) |
申请公布日期 |
2005.03.30 |
| 申请号 |
SG20040005048 |
申请日期 |
2004.08.23 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SENGERS, TIMOTHEUS FRANCISCUS;VAN DE KERKHOF, MARCUS ADRIANUS;KROON, MARK;VAN WEERT, KEES |
| 分类号 |
G01B15/00;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G01B15/00 |
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