SYSTEM AND METHOD FOR DETERMINING STRAY LIGHT IN A THERMAL PROCESSING SYSTEM

摘要

A system (10) and method for determining the reflectivity of a workpiece (W) during processing in a heating chamber (74) of a thermal processing apparatus (22). The system first determines directly the reflectivity of the workpiece outside of the heating chamber (74) of the thermal processing apparatus, and then determines the reflectivity of the workpiece during processing within the heating chamber (74) of the thermal processing apparatus (22) by correlating the ex situ wafer reflectivity with the intensity of the radiation reflected from the wafer within the heating chamber.