FILM DEPOSITION APPARATUS HAVING DUAL MAGNETRON SPUTTERING SYSTEM AND ION BEAM SOURCE WHICH ARE SYNCHRONIZED,申请号KR20020039953-传众专利搜索

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发明名称	FILM DEPOSITION APPARATUS HAVING DUAL MAGNETRON SPUTTERING SYSTEM AND ION BEAM SOURCE WHICH ARE SYNCHRONIZED
摘要
申请公布号	KR100480357(B1)	申请公布日期	2005.03.30
申请号	KR20020039953	申请日期	2002.07.10
申请人		发明人
分类号	C23C14/34;(IPC1-7):C23C14/34	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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