发明名称 Magnetic random access memory comprising MTJ layer and method of manufacturing
摘要 <p>Provided is an MRAM having a cell that comprises a transistor and an MTJ layer connected to the transistor, the MTJ layer having a tunneling film which has a uniform thickness, and a method of manufacturing the MRAM. The MTJ layer comprises: a lower electrode; a lower magnetic film; a tunneling film having a uniform thickness without waves; and an upper magnetic film, and the lower electrode comprises a first lower electrode and an amorphous second lower electrode. An amorphous flattening film can be further formed between the lower electrode and the lower magnetic film.</p>
申请公布号 EP1519417(A2) 申请公布日期 2005.03.30
申请号 EP20040255800 申请日期 2004.09.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, TAE-WAN;PARK, SANG-JIN
分类号 B82Y10/00;G11C11/15;B82Y25/00;B82Y40/00;G11C11/16;H01F10/06;H01F10/32;H01F41/30;H01L21/8246;H01L27/105;H01L27/115;H01L27/22;H01L43/08;H01L43/12;(IPC1-7):H01L27/22;H01L43/00;H01L21/824 主分类号 B82Y10/00
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