发明名称 |
Magnetic random access memory comprising MTJ layer and method of manufacturing |
摘要 |
<p>Provided is an MRAM having a cell that comprises a transistor and an MTJ layer connected to the transistor, the MTJ layer having a tunneling film which has a uniform thickness, and a method of manufacturing the MRAM. The MTJ layer comprises: a lower electrode; a lower magnetic film; a tunneling film having a uniform thickness without waves; and an upper magnetic film, and the lower electrode comprises a first lower electrode and an amorphous second lower electrode. An amorphous flattening film can be further formed between the lower electrode and the lower magnetic film.</p> |
申请公布号 |
EP1519417(A2) |
申请公布日期 |
2005.03.30 |
申请号 |
EP20040255800 |
申请日期 |
2004.09.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, TAE-WAN;PARK, SANG-JIN |
分类号 |
B82Y10/00;G11C11/15;B82Y25/00;B82Y40/00;G11C11/16;H01F10/06;H01F10/32;H01F41/30;H01L21/8246;H01L27/105;H01L27/115;H01L27/22;H01L43/08;H01L43/12;(IPC1-7):H01L27/22;H01L43/00;H01L21/824 |
主分类号 |
B82Y10/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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