发明名称 |
Electron optical system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
摘要 |
An electron optical system array has a plurality of electron lenses, the system array having at least two electrodes structures which respectively have membranes and are arranged along an optical axis, each of the membranes having a plurality of apertures through which charged-particle beams pass. There is also a spacer which is interposed between the facing membranes and adjacent to the aperture and which determines a gap between the facing membranes.
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申请公布号 |
US6872951(B2) |
申请公布日期 |
2005.03.29 |
申请号 |
US20010819672 |
申请日期 |
2001.03.29 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
YAGI TAKAYUKI;ONO HARUHITO;SHIMADA YASUHIRO |
分类号 |
G03F7/20;G21K1/087;H01J37/04;H01J37/12;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01J37/304 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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