发明名称 |
Method for forming micropatterns |
摘要 |
A method for forming micropatterns includes forming a thin film consisting of a single layer or of plural layers on a substrate, irradiating an energy beam to the thin film to elevate the temperature of a region to a predetermined temperature or higher to thereby modify the region of the thin film, and patterning the thin film at least in such a manner to leave over the modified region.
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申请公布号 |
US6872511(B2) |
申请公布日期 |
2005.03.29 |
申请号 |
US20020076972 |
申请日期 |
2002.02.15 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
HIROKANE JUNJI;MIEDA MICHINOBU;MORI GO |
分类号 |
G03C5/00;G03F7/00;G11B7/26;(IPC1-7):G11B7/26 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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