| 摘要 |
A reaction chamber system having a gas supply apparatus is provided to minimize unnecessary consumption of a reaction gas by using a substitute gas supply device for providing a substitute gas instead of the reaction gas during a wafer exchange period. A plurality of gas supply lines(161,162,163) are used for connecting a reaction chamber(120) to a plurality of gas supply sources(131,132,133). A plurality of gas supply valves(141,142,143,144) are arranged on the gas supply lines. A substitute gas supply line(168) is connected in parallel to the gas supply lines between the reaction chamber and at least one gas supply valve. A substitute gas supply valve(172) is arranged at the substitute gas supply line.
|
