| 摘要 |
A substrate chemical processing apparatus is provided to enhance a recycling rate of chemicals by installing a chiller to change the vaporized chemicals into the liquefied chemicals. A sealed bath(10) is used for processing a substrate by injecting chemicals onto a substrate. An exhaust tube(24) is connected to one side of the bath in order of exhaust vapor from the inside to the outside of the bath. A plurality of driving shafts are installed in the bath in order to support and transfer the substrate. A non-contact transmission part(16) is used for transmitting the driving force from a driving source to the driving shafts by using a magnetic method. A chiller(26) is installed around the exhaust tube in the inside of the bath in order to cool the vapor to the liquid.
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