| 摘要 |
A photolithography processing system includes a table for supporting a wafer, a plurality of illumination tools for illuminating a surface of the wafer positioned on the table, including a plurality of first illumination tools positioned laterally at different heights to illuminate the surface of the wafer at various predetermined angles of incidence and a second illumination tool to illuminate the surface of the wafer vertically from above the wafer on the table, a camera for taking pictures of the surface of the wafer, and a controller for controlling operations of the robot, the plurality of illumination tools and the camera and for detecting the presence of impure matters on the surface of the wafer, the controller including an elevating unit to slide up or down the first illumination tools and a luminous intensity unit to control luminous intensity.
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