PROCESS FOR PRODUCING A PHENOLIC RESIN FOR PHOTO RESIST, AND A COMPOSITION FOR PHOTO RESIST

摘要

Provided are a method for preparing a phenol resin for photoresist to improve productivity by reducing the pollution of production line due to the sublimate contained in a resin, and a resin composition for photoresist containing the resin prepared by the method. The method comprises the steps of reacting a phenol and an aldehyde to prepare a phenol resin A; dissolving the phenol resin A in an organic solvent, and reacting the obtained phenol resin A solution with an aldehyde in the presence of a solid catalyst to prepare a phenol resin B; and separating the phenol resin B from the solid catalyst, and reacting and/or concentrating the separated one. Preferably the phenol is a mixture of m-cresol and p-cresol in a ratio of 9:1 to 2:8 by weight; the aldehyde used in the second step is formaldehyde; and the solid catalyst is insoluble in water and/or an organic solvent and has a function as an acidic catalyst. The composition comprises the resin prepared by the method; a sensitizer; and a solvent.