发明名称 FLATTENING FINISH ETCHING LIQUID FOR COPPER AND COPPER ALLOY, AND ETCHING PROCESS THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide flattening finish etching liquids and an etching treatment method therefor which meet the need of the line-thinning, thinning and high functionalization of a printed circuit board by copper, a copper alloy or the like, . SOLUTION: The etching liquids is used for flattening finish for copper and a copper alloy by first and second etching stages. A first etching liquid used in the first etching stage and a second etching liquid used in the second etching stage are aqueous solutions both consisting of hydrogen peroxide and sulfuric acid as the main agents dissolving the copper and copper alloy. The etching liquids is prepared in such a manner that the first etching liquid contains aliphatic amines as an additive to the main agent, and the second etching liquid contains azoles as an additive to the main agent. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005076090(A) 申请公布日期 2005.03.24
申请号 JP20030308666 申请日期 2003.09.01
申请人 EBARA DENSAN LTD 发明人 MORIKAWA YOSHIHIKO;KANEKO TOMOHIRO
分类号 C23F1/18;H01L21/308;H05K3/06;(IPC1-7):C23F1/18 主分类号 C23F1/18
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