发明名称 System and method for electrolytic plating
摘要 An electrolytic plating system for plating a via in a printed circuit board. The electrolytic plating system includes an electrolytic plating bath, a support rod supporting the printed circuit board in the bath, and means for alternately generating a laminar flow of electrolyte on each side of said printed circuit board.
申请公布号 US2005061660(A1) 申请公布日期 2005.03.24
申请号 US20040989129 申请日期 2004.11.15
申请人 KEMPEN HEIN VAN 发明人 KEMPEN HEIN VAN
分类号 C25D5/02;C25D5/08;C25D17/00;H05K3/00;H05K3/42;(IPC1-7):C25D17/00 主分类号 C25D5/02
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