| 摘要 |
PROBLEM TO BE SOLVED: To provide a new method for observation of a reaction during exposure and of an accurate reaction during baking and to provide an apparatus therefor. SOLUTION: The photo-reaction analyzing apparatus includes a bake plate, a means to press a sample to the bake plate, a means to irradiate the sample with exposure energy, a means to irradiate the sample surface with light from a FT-IR light source to measure the FT-IR spectrum of the sample, and a means to pickup the response. The apparatus further includes a means to accurately control the distance between the bake plate and the sample. COPYRIGHT: (C)2005,JPO&NCIPI |
