| 摘要 |
PROBLEM TO BE SOLVED: To provide a means for verifying whether pattern data in an electron beam lithographic device are composed appropriately on a photomask. SOLUTION: As pattern data, not only drawing data corresponding to the photomask in a one-to-one relationship, but also drawing data, including data in all layers required for creating a semiconductor product used in a design stage and data to be drawn commonly to all layers of one semiconductor product, can be handled. A layer to be displayed can be changed arbitrarily by a user's operation. Further, the lithography image of the entire photomask can also be displayed, regardless of the layer. COPYRIGHT: (C)2005,JPO&NCIPI
|
