| 摘要 |
<P>PROBLEM TO BE SOLVED: To start discharging stably in plasma etching which uses He gas. <P>SOLUTION: In plasma etching which uses such gas that is mainly formed of He gas and is added with O2 gas, Cl2 gas is added in an initial stage of plasma discharging, and thereafter, supply of the Cl2 gas is stopped. Moreover, a little amount of Cl2 gas is added before starting of the discharging, and then discharging is started. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
