| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polar polymer which can suitably control adhesiveness to substrates and the like, solubility, and the like, and to provide a photosensitive composition which contains the polar polymer, has excellent cuttability in pattern-cutting, does not form scum on the pattern-cutting, inhibits the dissolution, swelling and the like of the pattern itself, even when developed with an alkali-developing solution having an ordinary concentration (about 0.5 to 20 mass %, preferably 1 to 10 mass %), improves the affinity and adhesiveness of a resist film to a substrate, when the resist film is formed on the substrate, and can efficiently prevent the development of the release, falling and the like of the pattern. <P>SOLUTION: This polar polymer is characterized by comprising at least carboxy group-containing units of structural formula (1) (R<SP>2</SP>is H or a substituent) and lactone ring-containing units of structural formula (2) (R<SP>1</SP>and R<SP>2</SP>are each H or a substituent; R is a substituent). And, the photosensitive composition is characterized by comprising the polar polymer and an acid-generating agent. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
