| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a silica scale remover enabling the silica scale derived from a polishing liquid attached to a device, the surrounding thereof or a silicon wafer to be readily removed and cleaned at chemical/mechanical polishing. <P>SOLUTION: The silica scale remover contains at least one kind of the compounds of (a) a polyhydric alcohol having hydroxy groups bonded to at least two neighboring carbon atoms of a 2-4C alkane respectively, (b) a 6-membered aromatic compound having hydroxy groups bonded to at least two neighboring carbon atoms forming an aromatic ring respectively, further having pH≥8 and soluble in water, and (c) a compound represented by general formula (I): NR<SB>1</SB>R<SB>2</SB>R<SB>3</SB>(wherein, R<SB>1</SB>, R<SB>2</SB>and R<SB>3</SB>are the same or different and each a hydrogen atom, a 2-hydroxyethyl group or a 2-hydroxypropyl group, with the proviso that not all thereof are simultaneously the hydrogen atom). The remover exhibits a pH of≥8 when diluted to 1/10 with water, and is substantially free from a metal ion. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
