CLEANING METHOD OF DEPOSITING EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method of depositing equipment capable of reducing the residual quantity of cleaning gas containing fluorine gas and fluorinated hydrogen gas for the structural components of the depositing equipment. SOLUTION: In the cleaning method of depositing equipment, depositing equipment having structural components made of quartz is used for forming a silicon based thin film and then silicon based deposits on the structural components are removed. While supplying cleaning gas containing fluorine gas and fluorinated hydrogen gas into the depositing equipment, the silicon based deposits are cleaned off by heating the structural components made of quartz and then cleaning gas supply is stopped and cleaning is ended at a temperature higher than 300°C. When cleaning is ended, the structural components made of quartz has a temperature exceeding 300°C. Subsequently, the structural components made of quartz is sustained at a temperature exceeding 300°C for at least 10 min by degassing treatment. COPYRIGHT: (C)2005,JPO&NCIPI