发明名称 |
APPARATUS FOR DETERMINING TWO SIDES OF CRYSTAL AND APPARATUS FOR DETERMINING CRYSTAL SLOPE ORIENTATION |
摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for determining two sides of a crystal, which can determine the two sides of a wafer in a short period of measurement time. SOLUTION: The wafer 1 is interposed among three pins to be positioned and fixed to a support base 2 so that a notch 1a of the wafer 1 is engaged to a movable pin 4. A plane perpendicular to the notch orientation 12 is set as an irradiation plane 13, and a measurement point M is irradiated with X-rays 8 along the irradiation plane 13, and the surface or rear side of the wafer 1 is determined, based on outputs from an X-ray detector 10 of a detecting section which is disposed out of the irradiation plane 13 and detects diffraction X-rays. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005077271(A) |
申请公布日期 |
2005.03.24 |
申请号 |
JP20030308813 |
申请日期 |
2003.09.01 |
申请人 |
TOSHIBA IT & CONTROL SYSTEMS CORP |
发明人 |
UYAMA KIICHIRO;SHINOHARA MASAHARU;MIZUGUCHI HIROSHI;ARAI KENJI;SONODA MASAAKI |
分类号 |
G01N23/207;(IPC1-7):G01N23/207 |
主分类号 |
G01N23/207 |
代理机构 |
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地址 |
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