发明名称 APPARATUS FOR DETERMINING TWO SIDES OF CRYSTAL AND APPARATUS FOR DETERMINING CRYSTAL SLOPE ORIENTATION
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for determining two sides of a crystal, which can determine the two sides of a wafer in a short period of measurement time. SOLUTION: The wafer 1 is interposed among three pins to be positioned and fixed to a support base 2 so that a notch 1a of the wafer 1 is engaged to a movable pin 4. A plane perpendicular to the notch orientation 12 is set as an irradiation plane 13, and a measurement point M is irradiated with X-rays 8 along the irradiation plane 13, and the surface or rear side of the wafer 1 is determined, based on outputs from an X-ray detector 10 of a detecting section which is disposed out of the irradiation plane 13 and detects diffraction X-rays. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005077271(A) 申请公布日期 2005.03.24
申请号 JP20030308813 申请日期 2003.09.01
申请人 TOSHIBA IT & CONTROL SYSTEMS CORP 发明人 UYAMA KIICHIRO;SHINOHARA MASAHARU;MIZUGUCHI HIROSHI;ARAI KENJI;SONODA MASAAKI
分类号 G01N23/207;(IPC1-7):G01N23/207 主分类号 G01N23/207
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