发明名称 SURFACE-TREATING METHOD AND METHOD OF MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a surface-treating method and a method of manufacturing devices avoiding an increase of the number of processes even when two or more kinds of functional solutions and giving a consistent contact angle. SOLUTION: The methods include application of a functional solution consisting of a film-forming ingredient dissolved or dispersed in a medium. The correlation among two or more types of solution-repelling treatment applied to the surface of a board P, two or more media and the contact angle for the functional solution is determined in advance. The type of solution-repelling treatment is selected based on the kind of the medium of the functional solution to be applied to the board P, an desired contact angle and the correlation. The methods have a process of applying the selected type of solution-repelling treatment to the surface of the board P. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005074331(A) 申请公布日期 2005.03.24
申请号 JP20030308970 申请日期 2003.09.01
申请人 SEIKO EPSON CORP 发明人 HIRAI TOSHIMITSU
分类号 B05D7/24;B05D7/00;H01L21/28;H01L21/288;H01L41/09;(IPC1-7):B05D7/24 主分类号 B05D7/24
代理机构 代理人
主权项
地址