发明名称 ELECTRON BEAM MEASURING DEVICE AND ELECTRON BEAM MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electron beam measuring device for converting an image photographed in a certain photographing posture into an image photographed in a photographing posture suitable for an purpose of use. SOLUTION: The device has a reference image selecting part 40 selecting either of right or left images of a stereoscopic image obtained from an electron beam detection part 4; a first correction coefficient measuring part 44 obtaining a first image correction coefficient to bring a non-reference image into an image deflection state of the reference image for the non-reference image of the right and the left images by using the reference image and by using a correspondent relation of the right and left images; a first image conversion part 46 image-converting the non-reference image by using the first coefficient; an image coordinate conversion part 48 coordinate-converting the reference image and image-converted non-reference image into an image in a reference state of a relatively inclined angle of a sample inclined part 5; and a coordinate measuring part 52 obtaining a shape or a coordinate value of the sample photographed in a stereoscopic image by making the coordinate-converted non-reference image and reference image be the stereoscopic image. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005078854(A) 申请公布日期 2005.03.24
申请号 JP20030305191 申请日期 2003.08.28
申请人 TOPCON CORP 发明人 TSURUGA YASUKO;OKADA SHINICHI;TAKACHI NOBUO
分类号 G01B15/00;G01B15/04;G01N23/225;H01J37/20;H01J37/22;(IPC1-7):H01J37/22 主分类号 G01B15/00
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