发明名称 SOLID STATE IMAGING DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a solid state imaging device capable of preventing color mixture by oblique light, and reducing the variation of light reception sensitivity existent among respective pixels. <P>SOLUTION: The solid state imaging device comprises a plurality of light receiving elements formed in a matrix form at equal intervals in a light receiving region regulated on a semiconductor substrate, a plurality of read electrodes provided on the semiconductor substrate corresponding to the plurality of the light receiving elements for reading electric charges generated by each the light receiving element, a light shielding film covering the plurality of the read electrodes and having an opening region on each light receiving element, and a plurality of reflecting walls formed in a lattice in a region above the light shielding film to partition the opening region on each light receiving element. The plurality of the reflecting walls are formed so that the middle point of the opposed walls with the opening region between is shifted in the direction of the center of the light receiving region with respect to the center of the opening region. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005079338(A) 申请公布日期 2005.03.24
申请号 JP20030307696 申请日期 2003.08.29
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KURIYAMA TOSHIHIRO
分类号 H01L27/14;H01L21/00;H01L27/146;H01L27/148;H01L31/02;H01L31/0216;H01L31/0232;H01L31/062;H04N5/225;H04N5/335;H04N5/365;H04N5/369;H04N5/372 主分类号 H01L27/14
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