| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing cloth which performs texture machining to the finish of super-high precision with extremely small surface roughness of a substrate, suppresses a defect caused by micro chips from polishing and abrasive grains biting into the substrate surface, has a high cleaning effect, and minimizes scratch defects caused by the local cohesion of abrasive grains. <P>SOLUTION: This polishing cloth is formed of a sheet-like material comprising a nonwoven fabric formed by three-dimensionally entangling super-fine short fiber bundles of 0.001-0.05 dtex in mean fineness, and a polymeric elastic body existing in the internal space, and having a napped surface formed of super-fine fiber, at least on one side, wherein most of the super-fine short fibers constituting the nonwoven fabric are fibers of roundish cross-sectional shape, and triangular to hexagonal ones out of the roundish cross-sectional shape, form a majority of the whole. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
