SOLUTION FOR LIQUID IMMERSION, AND LIQUID IMMERSION EXPOSURE MACHINE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a solution for liquid immersion which does not erode a head part of a projection optical system in a liquid immersion type projection aligner. SOLUTION: The liquid immersion type projection aligner irradiates a mask R with an exposure beam to transfer the pattern of the mask R onto a substrate W via the projection optical system PL. The solution for liquid immersion existing between the surface of the substrate W and an optical element 4 formed of fluorite which is located on the substrate W side of the projection optical system PL contains fluorine ions or fluoride ions. COPYRIGHT: (C)2005,JPO&NCIPI