| 发明名称 |
Positive resist composition and pattern formation method using the same |
| 摘要 |
A positive resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid and (B-1) a compound having a structure represented by formula (I) defined in the specification.
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| 申请公布号 |
US2005064329(A1) |
申请公布日期 |
2005.03.24 |
| 申请号 |
US20040942852 |
申请日期 |
2004.09.17 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TAKAHASHI HYOU |
| 分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03C1/76 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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