发明名称 VACUUM TREATMENT APPARATUS AND VAPOR DEPOSITION APPARATUS
摘要 <p>It has been found that an organic component is emitted from a member such as a crucible or a gasket constituting an apparatus for vacuum treatment and an element is contaminated with said organic component emitted, and, as a result, members of the apparatus for vacuum treatment are subjected to a treatment for reducing the emission of an organic component. For example, a crucible is made from a material having a reduced catalytic activity to a material for use in the vapor deposition in question and a gasket is used after a treatment for reducing the bleeding of an organic component or is made from a material containing a reduced amount of an organic component.</p>
申请公布号 WO2005025735(A1) 申请公布日期 2005.03.24
申请号 WO2004JP12239 申请日期 2004.08.19
申请人 MORIMOTO, AKIHIRO;OHMI, TADAHIRO;SHIRAI, YASUYUKI 发明人 OHMI, TADAHIRO;SHIRAI, YASUYUKI;MORIMOTO, AKIHIRO
分类号 B01J3/00;H05B33/10;B01J3/02;C23C14/24;C23C14/56;H01L51/50;(IPC1-7):B01J3/00;C23C14/00;H05B33/14 主分类号 B01J3/00
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