发明名称 DIAMOND ELEMENT AND MANUFACTURING METHOD FOR DIAMOND ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a diamond element excellent in height uniformity not affected by grain boundary among crystals. <P>SOLUTION: In the subject manufacturing method, a first step in which a resist arranged with a pattern of a plurality of minute circles is formed, a second step in which a substrate is processed into a structure in which a plurarity of cylinders are protruded from the surface of the substrate by etching, and a third step in which the cylinders are rearranged into quadrangular prisms by exposing the substrate processed in the second step to a plasma of a gas mainly composed of hydrogen, then a diamond crystal having a (111) face as an exposed face is grown from the border of the quadrangular prisms and the surface of the substrate, and at the same time the tops of the quadrangular prisms are sharpened, are carried out on a diamond single crystal substrate having a (100) face on its surface, and the third step is finished before the diamond crystal is grown from the border of the quadrangular prisms and the surface of the substrate reaches the tops of the quadrangular prisms. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005075681(A) 申请公布日期 2005.03.24
申请号 JP20030307764 申请日期 2003.08.29
申请人 SUMITOMO ELECTRIC IND LTD 发明人 NISHIBAYASHI YOSHIKI;ANDO YUTAKA;IMAI TAKAHIRO
分类号 C01B31/06;C30B29/04;G01Q60/22;G01Q60/38;H01J1/304;H01J9/02 主分类号 C01B31/06
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