发明名称 |
METHOD AND APPARATUS FOR PROVIDING GAS TO A PROCESSING CHAMBER |
摘要 |
A method and apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a canister having at least one baffle disposed between two ports and containing a precursor material. The precursor material is adapted to produce a gas vapor when heated to a defined temperature at a defined pressure. The baffle forces a carrier gas to travel an extended mean path between the inlet and outlet ports. In another embodiment, an apparatus for generating gas includes a canister having a tube that directs a carrier gas flowing into the canister away from a precursor material disposed within the canister. |
申请公布号 |
KR20050029221(A) |
申请公布日期 |
2005.03.24 |
申请号 |
KR20057000844 |
申请日期 |
2005.01.17 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
CHEN, LING;GANGULI, SESHADRI;KU, VINCENT, W. |
分类号 |
C23C16/18;C23C16/34;C23C16/44;C23C16/448;C23C16/455;H01L21/31;(IPC1-7):B01D7/00;C23C16/00;H01L21/00 |
主分类号 |
C23C16/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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