METHOD FOR FORMING THIN FILM PATTERN, FILM, ELECTONIC DEVICE, LIQUID CRYSTAL PANEL, AND ELECTRONIC EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a film while appropriately preventing the film from being in the shape of a meniscus, and an electronic device, a liquid crystal panel, and electronic equipment fitted with the film.

SOLUTION: The method for forming a thin film pattern has a liquid application process for applying a film forming liquid 7 on a substrate 5 coated with a mask 6. In this process, the contact angle of the liquid 7 to the opening inner surface of the mask 6 is at least 90°. The mask 6 has footing 61 and a surface layer 62 formed on the surface side of the footing 61. The surface layer 62 is preferably formed mainly from a fluorine-containing compound and/or a silicon compound. The surface layer 62 is preferably formed by plasma polymerization.

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