发明名称 |
Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization |
摘要 |
A sweeping linear magnetron is described. The magnetron has a cathode backing plate, a drive housing attached to the cathode backing plate and a motor held in the drive housing. The motor drives a yoke positioned within a cut-out in the backing plate. The yoke has a magnet pack attached thereto said yoke such that the magnet pack is adapted to being moved over a target material and wherein the target material is being sputtered within a vacuum chamber onto a substrate.
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申请公布号 |
US2005061666(A1) |
申请公布日期 |
2005.03.24 |
申请号 |
US20030667202 |
申请日期 |
2003.09.19 |
申请人 |
GUPTA SUBHADRA;RUSPINI ANDREW |
发明人 |
GUPTA SUBHADRA;RUSPINI ANDREW |
分类号 |
C23C14/00;C23C14/35;H01J37/34;(IPC1-7):C23C14/00 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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