发明名称 Power semiconductor element capable of improving short circuit withstand capability while maintaining low on-voltage and method of fabricating the same
摘要 In a p-type base layer of a trench IGBT comprising a p-type collector layer, an n-type base layer formed on the p-type collector layer, the p-type base layer formed on the n-type base layer, and an n-type emitter layer formed on the surface of the p-type base layer, the point of the highest impurity concentration is located closer to the n-type base layer than the junction with the emitter layer. In other words, the pinch-off of the channel is generated in the position closer to the n-type base layer than to the junction between the p-type base layer and the n-type emitter layer.
申请公布号 US2005062064(A1) 申请公布日期 2005.03.24
申请号 US20040962713 申请日期 2004.10.13
申请人 HATTORI HIDETAKA;YAMAGUCHI MASAKAZU 发明人 HATTORI HIDETAKA;YAMAGUCHI MASAKAZU
分类号 H01L29/749;H01L21/331;H01L29/06;H01L29/10;H01L29/739;H01L29/745;H01L29/78;(IPC1-7):H01L29/739 主分类号 H01L29/749
代理机构 代理人
主权项
地址