发明名称 |
Substrate treating apparatus |
摘要 |
A substrate treating apparatus is capable of promptly heating substrates after exposure, and avoiding an adverse thermal influence on an exposing apparatus. A developing block includes heating modules for heating exposed substrates. An interface block is interposed between the heating modules and the exposing apparatus to isolate the exposing apparatus from the thermal influence of the heating modules. The interface block has a transport mechanism for transporting the substrates to the heating modules, whereby the exposed substrates are promptly transferred to the heating modules.
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申请公布号 |
US2005061441(A1) |
申请公布日期 |
2005.03.24 |
申请号 |
US20040942180 |
申请日期 |
2004.09.16 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
HASHINOKI KENJI;YAMAMOTO SATOSHI;KOYAMA YASUFUMI |
分类号 |
H01L21/677;G03F7/38;H01L21/00;H01L21/027;(IPC1-7):C23F1/00 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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