摘要 |
A machine or machine component 1, having a hollow space 2 for a fluid or a granular product, and including movable machine elements, further includes a plasma cleaning arrangement comprising: means for supplying a process gas to the hollow space 8; and means for generating a plasma from the process gas, in the hollow space of the machine or machine component. The plasma may be generated by at least one electrode 5 fitted in or on the hollow space 2, or by other means such as microwave radiation or capacitive electrodes. The walls of the hollow space may act as a grounded return electrode 7. The invention allows cleaning of components and systems, including pumps, filters, catalytic converters, reactors, pipelines, injection moulds and mixers, even while in use. Deposits in the hollow space may be removed at any time or avoided from the outset. |