SYSTEM FOR CONTROLING PRESSURE OF LOW PRESSURE-CHEMICAL VAPOR DEPOSITION EQUIPMENT

摘要

A system for controlling the pressure of low pressure CVD(chemical vapor deposition) equipment is provided to improve productivity by displaying an output voltage according to a pressure detection signal of a low pressure baratron sensor, and to prevent a process defect by checking a defect of the low pressure baratron sensor and by generating an interlock or alarm message. A low pressure baratron sensor(110) detects the pressure in a chamber. A sensor control part(120) outputs the first output voltage by using a pressure detection signal of the low pressure baratron sensor. An automatic pressure adjustment control part(130) outputs the second output voltage for controlling the pressure in the chamber by using the first output voltage. An automatic pressure control valve(140) receives the second output voltage and controls the pressure in the chamber. A display part displays the pressure in the chamber and the first output voltage according to a control signal of the automatic pressure adjustment control part.