METHOD, DEVICE, AND PROGRAM FOR EDITING ELECTRON BEAM LITHOGRAPHY DATA AND ELECTRON BEAM LITHOGRAPHY EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a method, device, and program for editing electron beam lithography data by which the accuracy of a mask can be improved by minimizing the influences of the minute graphics on the accuracy in lithography data containing minute graphics, and to provide electron beam lithography equipment.

SOLUTION: In the method for editing electron beam lithography data, lithography data to be plotted on an object to be exposed by using an electron beam are edited. Only partial data containing the minute graphics of the lithography data are extracted as an object to be edited and the extracted partial data are edited. Then the edited partial data are reflected in the original lithography data.

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