IMPRINT LITHOGRAPHIC METHOD, AND DEVICE AND STAMP FOR USE IN IMPRINT LITHOGRAPHY

摘要

Disclosed is an imprint lithographic method for creating a structure on a substrate with the aid of at least one stamp that comprises a stamp member with a three-dimensionally structured surface for creating a three-dimensional imprint in a layer of an embossing substance, which is arranged on the substrate. According to the inventive method, a first stamp is supplied in an operating position on an imprint lithographic device, and at least one imprint is created in the embossing substance by means of the first stamp. The first stamp is then automatically removed from the operating position by means of a stamp replacement mechanism so as to treat said stamp outside the operating position, and the first stamp or a second stamp is automatically placed in the operating position with the aid of the stamp replacement mechanism. The treatment may comprise inspection and/or cleaning of stamps in order to ensure an almost trouble-free production process at a high output.